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HelioVolt Corporation was founded in 2001 in order to develop and market new technology for applying thin film photovoltaic coatings to a variety of substrates including conventional construction materials. The company's proprietary FASST process, based on rapid semiconductor printing, was invented by HelioVolt founder Dr. Billy J. Stanbery, an eminent expert within the international PV community in the materials science of CIGS and related compound semiconductors. FASST is a low-cost, flexible manufacturing process for CIGS synthesis and is protected by both nine issued US patents and by numerous global patents pending.